IC晶片電路製作方法，主要是微影製程，2024年, IC製程已可量產3nm(奈米)!
2025年, IC製程已可試量產2nm(奈米)!
奈米壓印微影(NIL, Nano-imprint lithography process)製程是Canon最近幾年提出的，2023年Canon宣稱可以做到7nm(奈米)，2024年Canon又宣稱可以做到5 nm(奈米)!
因此，本書將介紹7奈米IC晶片電路製作方法:
半導體微影製程: 多重曝光方法!
實施多次多重曝光方法，可以提高多倍的解析度!但是良率(yield rate)也會降低很多!
這就是使用193奈米曝光機，作7奈米的結果!
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